低渗致密气藏基质酸化产能评价及特征分析PRODUCTIVITY EVALUATION AND CHARACTERISTIC ANALYSIS OF THE MATRIX ACIDIZING FOR LOW-PERMEABILITY TIGHT GAS RESERVOIRS
方文超,姜汉桥,孙彬峰
FANG Wenchao,JIANG Hanqiao,SUN Binfeng
摘要(Abstract):
为准确评价低渗致密气藏基质酸化后的气井产能,指导酸化施工方案设计,依据酸化规模建立了2种典型酸化后地层模型,在分析渗流模式的基础上采用分流动区域的方法分别推导出2种模型的气井产能评价公式,并分析了基质酸化后气井产能特征。对于低渗致密气藏,当酸化规模较小时,增加酸液有效作用距离比增加酸化带渗透率增产效果更明显,此时酸化工作液应着重考虑缓速酸体系。当酸化规模较大时,若储层含较多的酸蚀矿物,增大酸液有效作用距离更利于增产;但若储层较难酸蚀,则增加酸化带渗透率更利于增产,此时工作液应着重考虑强酸体系或易返排的泡沫酸体系。
In order to accurately evaluate the productivity of low-permeability tight gas wells after acidizing the matrix and guide the design of the acidizing program,two types of the acidized formation model are established according to the sizes of acidizing;on the basis of analyzing the seepage patterns,by means of flow zoning method,the evaluating equations of the gas-well productivity for the two models are derived respectively,and meantime the productivity characteristics are analyzed after the matrix acidizing.For low-permeability tight gas reservoirs,when the size of the acidizing is small,the results of enlarging the effective acting range is more obvious than those of improving the permeability of the acidified belt.In this case,retarded acid system should be considered as the acidizing liquid.When the size of the acidizing is big,if there are much more etching minerals in the formation,the more stimulated production can be achieved when increasing the effective acting range;however,if the reservoirs are difficuh to acidize and etch,improving the permeability of the acidified belt is more effective,for this situation,strong or easy-to-flow-back foamed acid systems should be focused on as the operating fluids.
关键词(KeyWords):
低渗致密气藏;基质酸化;产能评价;产能特征;酸化规模;有效作用距离;缓速酸;泡沫酸
low-permeability tight gas reservoir;matrix acidizing;productivity evaluation;productivity characteristic;size of acidizing;effective range;retarded acid;foamed acid
基金项目(Foundation): 国家“973”重点技术研究发展计划项目“中国南方海相页岩气高效开发的基础研究”(2013CB228000)
作者(Author):
方文超,姜汉桥,孙彬峰
FANG Wenchao,JIANG Hanqiao,SUN Binfeng
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